Materials Science in Semiconductor Processing
Leading citation impact metric from Clarivate Journal Citation Reports
49 papers with at least that number of citations each
State Council for Professorship (HĐGSNN) Scoring
Quyết định số 26/QĐ-HĐGSNN ngày 11/7/2025 (Mục quốc tế)
HĐGSNN Score History
By article publication year| Year | Max Score | Evaluation Details | Source |
|---|---|---|---|
| 2026 | 3.00đ | WoS Q1 có IF ≥ 5.0(IF: 5.2) | 🔵 Computed |
| 2025 | 2.50đ | WoS Q1 có IF ≥ 3.0(IF: 4.6) | 🔵 Computed |
| 2024 | 2.50đ | WoS Q1 có IF ≥ 3.0(IF: 4.2) | 🔵 Computed |
| 2023 | 2.50đ | WoS Q1 có IF ≥ 3.0(IF: 4.1) | 🔵 Computed |
| 2022 | 2.50đ | WoS Q1 có IF ≥ 3.0(IF: 4.644) | 🔵 Computed |
| 2021 | 2.50đ | WoS Q1 có IF ≥ 3.0(IF: 3.927) | 🔵 Computed |
| 2020 | 2.50đ | WoS Q1 có IF ≥ 3.0(IF: 3.085) | 🔵 Computed |
| 2019 | 2.00đ | WoS Q1(IF: 2.722) | 🔵 Computed |
| 2018 | 2.00đ | WoS Q1(IF: 2.593) | 🔵 Computed |
Note: Domestic journal scores are officially collected from annual HĐGSNN decisions across councils. International journal scores are dynamically computed according to Decision 26/QĐ-HĐGSNN based on quartile and citation metrics in the publication year.
Aims & Scope
Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy. Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications. Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.
SCImago & Scopus Journal Intelligence
Global SCImago ranking, SJR prestige index, Scopus coverage, and societal policy impact
Weighted prestige citation metric per document indexed in the Scopus database.
Measures cumulative publication volume and citation impact.
Average citations received per document published in the 2-year window.
Estimated Article Processing Charge for Open Access publication.
Scopus 3-Year Publication & Citation Window
Aggregated from Scopus database across the 3-year SJR evaluation window.
Societal Impact & Inclusivity (SCImago)
Citations in government and international policy documents
Percentage of female authors published in the journal
Real-world societal policy reach and author gender diversity tracked by SCImago.
Scopus Subject Categories
Chinese Academy of Sciences (CAS) Classification
Major / minor zone classification and CAS Early Warning List history
Publishing & Editorial Information
Detailed publisher, peer-review turnaround, and publication cycle specifications
WoS Categories & Quartiles
Detailed JCR / JCI category rankings and quartile breakdown from Clarivate
| Category | Index | Rank | Quartile |
|---|---|---|---|
ENGINEERING, ELECTRICAL & ELECTRONIC | JCRSCIE | 85/369 | Q1 |
MATERIALS SCIENCE, MULTIDISCIPLINARY | JCRSCIE | 165/472 | Q2 |
PHYSICS, APPLIED | JCRSCIE | 46/191 | Q1 |
PHYSICS, CONDENSED MATTER | JCRSCIE | 24/81 | Q2 |
ENGINEERING, ELECTRICAL & ELECTRONIC | JCISCIE | 123/371 | Q2 |
MATERIALS SCIENCE, MULTIDISCIPLINARY | JCISCIE | 143/473 | Q2 |
PHYSICS, APPLIED | JCISCIE | 51/191 | Q2 |
PHYSICS, CONDENSED MATTER | JCISCIE | 19/81 | Q1 |
Annual Historical Statistics & Publications
Track annual publication volume, total citations, and Impact Factor evolution
| Year | Impact Factor | Articles / Year | Total Citations |
|---|---|---|---|
| 2026 | — | 715 | 390 |
| 2025 | 4.6 | 1,016 | 4,366 |
| 2024 | 4.2 | 1,034 | 12,022 |
| 2023 | 4.1 | 677 | 9,346 |
| 2022 | 4.644 | 726 | 13,007 |
| 2021 | 3.927 | 660 | 13,857 |
| 2020 | 3.085 | 634 | 15,479 |
| 2019 | 2.722 | 518 | 14,288 |
| 2018 | 2.593 | 448 | 12,556 |
| 2017 | — | 588 | 11,908 |
| 2016 | — | 502 | 8,511 |
| 2015 | — | 719 | 23,032 |
Journal Metrics & Citation Visualizations
Impact Factor Trend (2018–2024)
Clarivate IF trend for Materials Science in Semiconductor Processing
Total Cites vs Self-Cites
Evaluation of scholarly independence and citation reach
Citations per Document
Citation metric windows across 2, 3, and 4 years
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Journals in the same research field with comparable impact metrics