SciSight Ecosystem
SciSightAcademic Intelligence & JCR Rank
WoS SCIE Q4CAS 4区Hybrid

Journal of Vacuum Science & Technology B

Abbreviation (ISO):J VAC SCI TECHNOL B
Country: United States•WoS SCIE Quartile: Q4•Identifier (ISSN):1071-1023(Print)•Articles / Year: 149
Clarivate IF (2026)Q4
1.6
↑ +0.4

Leading citation impact metric from Clarivate Journal Citation Reports

JCR Release Date: 2026-06-17
H-Index (Hirsch Index)
N/A

papers with at least that number of citations each

WoS: SCIE / JCRQ4
Self-Citation Rate13.3%
Safe Level (< 15%)Warning Level (> 20%)
Self-citation below 15% indicates strong scholarly independence.
Volume & Open AccessHybrid
149articles/year
9.78% Gold OA•99.35% Original Research

State Council for Professorship (HĐGSNN) Scoring

Quyết định số 26/QĐ-HĐGSNN ngày 11/7/2025 (Mục quốc tế)

1.00pts
Latest Max Score
Estimated (Dec 26)
Scoring Basis: WoS Q4(IF: 1.6)

HĐGSNN Score History

By article publication year
YearMax ScoreEvaluation DetailsSource
20261.00đ
WoS Q4(IF: 1.6)
🔵 Computed
20251.00đ
WoS Q4(IF: 1.2)
🔵 Computed
20231.00đ
WoS Q4(IF: 1.4)
🔵 Computed
20221.00đ
WoS Q4(IF: 1.572)
🔵 Computed
20211.00đ
WoS Q4(IF: 1.416)
🔵 Computed
20201.00đ
WoS Q4(IF: 1.511)
🔵 Computed

Note: Domestic journal scores are officially collected from annual HĐGSNN decisions across councils. International journal scores are dynamically computed according to Decision 26/QĐ-HĐGSNN based on quartile and citation metrics in the publication year.

Aims & Scope

Journal of Vacuum Science & Technology B emphasizes processing, measurement and phenomena associated with micrometer and nanometer structures and devices. Processing may include vacuum processing, plasma processing and microlithography among others, while measurement refers to a wide range of materials and device characterization methods for understanding the physics and chemistry of submicron and nanometer structures and devices.

Topics Covered (Recognized by AI)
Physics98.5%Materials science98.5%Quantum mechanics91.4%Chemistry89.2%Nanotechnology84.2%Organic chemistry83.6%Composite material80.4%Optoelectronics80.4%Engineering79.6%Optics63.8%Layer (electronics)54.1%Metallurgy46.5%Electrical engineering46.1%Chemical engineering34.5%Medicine32.5%Nuclear physics32.5%Biology32.4%Computer science32.1%Thermodynamics30.8%Pathology30%Alternative medicine27%Fabrication26.9%Geology25.5%Condensed matter physics25%Chromatography24.7%Physical chemistry23.7%Analytical Chemistry (journal)22.9%Environmental chemistry22.9%Mathematics21.8%Electron20.9%
Primary Research Areas
Engineering & TechnologyEngineering: Electrical & Electronic
Official WebsiteNLM PubMed CatalogSubmission Portal

SCImago & Scopus Journal Intelligence

Not indexed in SCImago / Scopus database

This journal is currently not indexed in Scopus or is an academic publication indexed exclusively in Web of Science (WoS).

Chinese Academy of Sciences (CAS) Classification

Major / minor zone classification and CAS Early Warning List history

Major Category (Broad Field):
4区 (Zone 4)Engineering & Technology
Minor Category (Specific Field):
4区ENGINEERING, ELECTRICAL & ELECTRONIC
CAS Early Warning List History:
Updated annually: 2020 – 2024
2020
Not warned
2021
Not warned
2022
Not warned
2023
Not warned
2024
Not warned

Publishing & Editorial Information

Detailed publisher, peer-review turnaround, and publication cycle specifications

Publisher Review Speed
Updating
Average time to first editorial decision
Online Publication Speed
Updating
Time from acceptance to online publication
Official Acceptance Rate
Updating
Manuscript acceptance rate confirmed by the publisher
Open Access Model
Hybrid
OA publishing option or traditional subscription
Publisher
A V S AMER INST PHYSICS
Publication Language
English
Frequency
Bimonthly
Founding Year
1991
Editorial Address
A V S AMER INST PHYSICS, STE 1 NO 1, 2 HUNTINGTON QUADRANGLE, MELVILLE, USA, NY, 11747-4502
Indexing & Databases
SCIEPubMed

WoS Categories & Quartiles

Detailed JCR / JCI category rankings and quartile breakdown from Clarivate

Clarivate JCR & JCI
CategoryIndexRankQuartile
ENGINEERING, ELECTRICAL & ELECTRONIC
JCRSCIE
280/369Q4
NANOSCIENCE & NANOTECHNOLOGY
JCRSCIE
128/148Q4
PHYSICS, APPLIED
JCRSCIE
148/191Q4
ENGINEERING, ELECTRICAL & ELECTRONIC
JCISCIE
299/371Q4
NANOSCIENCE & NANOTECHNOLOGY
JCISCIE
125/148Q4
PHYSICS, APPLIED
JCISCIE
154/191Q4

Annual Historical Statistics & Publications

Track annual publication volume, total citations, and Impact Factor evolution

17 year
YearImpact FactorArticles / YearTotal Citations
20251.2——
20231.4——
20221.572——
20211.416——
20201.511——
2015—31
2014—10
2012—18
2011—21
2010—21
2009—6398,683
2008—4819,138
2007—4909,533
2006—61110,467
2005—5729,951
2004—67713,203
2003—55912,835
Academic Metric Intelligence

Journal Metrics & Citation Visualizations

Impact Factor Trend (2018–2024)

Clarivate IF trend for Journal of Vacuum Science & Technology B

WoS Q4
0112202020212022202320251.20
Annual Impact Factor Metric
2025:1.2

Total Cites vs Self-Cites

Evaluation of scholarly independence and citation reach

Total citations steady growth
Self-citation: 13.3%

Citations per Document

Citation metric windows across 2, 3, and 4 years

Cites / Doc (4 years)Cites / Doc (3 years)Cites / Doc (2 years)

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Record UUID: 959874a2-7cbd-4495-81a3-d30c93abc77b
Database Updated: 2026-10-01